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Design for AM includes new design models, methods, processes and tools focused on the link between designing and manufacturing Additively Manufactured (AM) parts, and understanding and characterising AM processes and materials such that they can be better and more fully exploited in design. Designers can now mix and place materials where needed, print or integrate electronics and other components to achieve highly integrated functions. But approaches to better represent, analyse and optimise designs for AM, taking the characteristics and constraints of the processes into consideration are necessary. Further, design needs must be identified to drive the development of innovative and advanced applications and potentially new AM processes. The “Design for Additive Manufacturing” (DfAM) SIG provides a multidisciplinary forum to discuss international efforts on these topics and train future designers and researchers to take advantage of the new design opportunities that AM technologies provide.







  • Ian Ashcroft, University of Nottingham, UK
  • Alain Bernard, Ecole Centrale de Nantes, France
  • Ian Campbell, Loughborough University, UK
  • Carolyn Seepersad, University of Texas at Austin, USA
  • Georges Fadel, Clemson University, USA
  • Ian Gibson, Deakin University, Australia
  • Richard Hague, University of Nottingham, UK
  • David Rosen, Georgia Tech, USA
  • Kristina Shea, ETH Zurich, Switzerland
  • Christopher Williams, Virginia Tech, USA


The DfAM SIG wishes to thank the following SIG members and collaborators for their contribution into the SIG activities:

  • Anna Öhrwall Rönnbäck, Luleå University of Technology, Sweden (SIG scientific advisor)
  • Alexandra Blösch-Paidosh, ETH Zurich, Switzerland (SIG DESIGN18 & ICED19 workshop facilitator)
  • Angelica Lindwall, Luleå University of Technology, Sweden (SIG ICED19 workshop facilitator)
  • Carolyn Seepersad, University of Texas at Austin, USA (keynote speaker at the ICED15 conference to launch the DfAM SIG and organiser of the Design for AM – SIG workshop at the 2018 SFF symposium)
  • Giulia Wally Scurati, Politecnico di Milano, Italy (SIG Graphics)

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